Please use this identifier to cite or link to this item: https://doi.org/10.1163/156856101753207733
Title: Modification of Si(100) surface by plasma-enhanced graft polymerization of allylpentafluorobenzene
Authors: Zou, X.P.
Kang, E.T. 
Neoh, K.G. 
Huang, W. 
Keywords: Allypentafluorobenzene
Annealing
Plasma polymerization
Si(100)
XPS
Issue Date: 2001
Source: Zou, X.P., Kang, E.T., Neoh, K.G., Huang, W. (2001). Modification of Si(100) surface by plasma-enhanced graft polymerization of allylpentafluorobenzene. Journal of Adhesion Science and Technology 15 (13) : 1655-1672. ScholarBank@NUS Repository. https://doi.org/10.1163/156856101753207733
Abstract: Hydrophobic fluoropolymer thin films were deposited on Si(100) substrates by plasma polymerization of allylpentafluorobenzene (APFB) under different glow discharge conditions, and in the presence and absence of Ar plasma pre-activation of the substrate surfaces. The FTIR and X-ray photoelectron spectroscopy (XPS) results suggested that the plasma polymerization proceeded mainly through the C=C bond of APFB, and the fluorinated aromatic structure in the deposited polymer films was preserved to different extents, depending on the radio-frequency (RF) power used for plasma polymerization. The use of a low RF power (∼5 W) readily resulted in the deposition of thin films having nearly the same fluorinated aromatic structure as that of the APFB homopolymer. For the plasma-polymerized APFB (pp-APFB) films deposited on the Ar plasma-preactivated Si(100) surfaces, solvent extraction results suggested that the pp-APFB films became covalently tethered onto the silicon substrate surfaces. Thermogravimetric (TG) analysis results indicated that the thermal stability of the pp-APFB films had been enhanced substantially after annealing at 270°C in a vacuum oven.
Source Title: Journal of Adhesion Science and Technology
URI: http://scholarbank.nus.edu.sg/handle/10635/52670
ISSN: 01694243
DOI: 10.1163/156856101753207733
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