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https://doi.org/10.1007/s10832-006-9909-x
| Title: | Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing | Authors: | Li, Q. Ong, C.K. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. |
Keywords: | High-k dielectric thin films Metal-oxide-semiconductor Rapid thermal annealing UHV sputtering |
Issue Date: | 2006 | Citation: | Li, Q., Ong, C.K., Wang, S.J., Wang, W.D., Chi, D.Z., Huan, A.C.H. (2006). Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing. Journal of Electroceramics 16 (4) : 517-521. ScholarBank@NUS Repository. https://doi.org/10.1007/s10832-006-9909-x | Source Title: | Journal of Electroceramics | URI: | http://scholarbank.nus.edu.sg/handle/10635/28959 | ISSN: | 13853449 15738663 |
DOI: | 10.1007/s10832-006-9909-x |
| Appears in Collections: | Staff Publications |
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