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https://doi.org/10.1038/s41699-020-00190-0
Title: | Electron-beam-irradiated rhenium disulfide memristors with low variability for neuromorphic computing | Authors: | Sifan Li, Bochang Li FENG XUEWEI Li Chen LI YESHENG Li Huang Fong Xuanyao Kah-Wee Ang |
Issue Date: | 12-Jan-2021 | Publisher: | Nature | Citation: | Sifan Li, Bochang Li, FENG XUEWEI, Li Chen, LI YESHENG, Li Huang, Fong Xuanyao, Kah-Wee Ang (2021-01-12). Electron-beam-irradiated rhenium disulfide memristors with low variability for neuromorphic computing. npj 2D Materials and Applications 5 : 1. ScholarBank@NUS Repository. https://doi.org/10.1038/s41699-020-00190-0 | Rights: | Attribution-NoDerivatives 4.0 International | Abstract: | State-of-the-art memristors are mostly formed by vertical metal-insulator-metal (MIM) structure, which rely on the formation of conductive filaments for resistive switching (RS). However, owing to the stochastic formation of filament, the set/reset voltage of vertical MIM memristors are difficult to control, which results in poor temporal and spatial switching uniformity. Here, a two-terminal lateral memristor based on electron beam irradiated rhenium disulfide (ReS2) is realized, which unveil a unique resistive switching mechanism based on Schottky barrier height (SBH) modulation. The devices exhibit a forming-free, stable gradual RS characteristic, and simultaneously achieve a small transition voltage variation during positive and negative sweeps (6.3%/5.3%). The RS is attributed to the motion of sulfur vacancies induced by voltage bias in the device, which modulates the ReS2/metal SBH. The gradual SBH modulation stabilizes the temporal variation in contrast to the abrupt RS in MIM-based memristors. Moreover, the emulation of long-term synaptic plasticity of biological synapses is demonstrated using the device, manifesting its potential as artificial synapse for energy-efficient neuromorphic computing applications. | Source Title: | npj 2D Materials and Applications | URI: | https://scholarbank.nus.edu.sg/handle/10635/225296 | DOI: | 10.1038/s41699-020-00190-0 | Rights: | Attribution-NoDerivatives 4.0 International |
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