Please use this identifier to cite or link to this item: https://doi.org/10.1039/c6ra03383k
Title: Rapid thermal annealing assisted stability and efficiency enhancement in a sputter deposited CuO photocathode†
Authors: Masudy-Panah, S 
Siavash Moakhar, R
Chua, C.S
Kushwaha, A
Wong, T.I
Dalapati, G.K
Keywords: Corrosion
Field emission cathodes
Grain size and shape
Light absorption
Photocathodes
Photocurrents
Rapid thermal annealing
Thick films
Annealing temperatures
As-deposited films
Crystallinities
Efficiency enhancement
Film crystallinity
Photocatalytic water splitting
Photocurrent generations
Rapid thermal treatment
Copper oxides
Issue Date: 2016
Citation: Masudy-Panah, S, Siavash Moakhar, R, Chua, C.S, Kushwaha, A, Wong, T.I, Dalapati, G.K (2016). Rapid thermal annealing assisted stability and efficiency enhancement in a sputter deposited CuO photocathode†. RSC Advances 6 (35) : 29383-29390. ScholarBank@NUS Repository. https://doi.org/10.1039/c6ra03383k
Rights: Attribution 4.0 International
Abstract: We designed a stable and efficient CuO based photocathode by tuning the crystallinity and surface morphology of films by rapid thermal treatment. The role of the annealing temperature on film crystallinity, optical absorption and grain size is studied. The impact of these parameters upon the photocatalytic water splitting performance of CuO films is investigated. We observed that a higher annealing temperature improves the film crystallinity and increases the grain size of CuO film, which significantly enhance the photocurrent generation capability. Rapid thermal annealing at 550 C is found the best temperature to achieve the highest PEC performance. The thickness of the CuO photocathodes is also optimized and we observed that 550 nm thick films results in the highest photocurrent of 1.68 mA cm2. Our optimized CuO photocathode has shown better stability against photo-corrosion and a 30% decrease in the initial value of photocurrent is measured after 15 min, while a 60% decrease in the photocurrent is noticed in case of the as-deposited film. © The Royal Society of Chemistry 2016.
Source Title: RSC Advances
URI: https://scholarbank.nus.edu.sg/handle/10635/180295
ISSN: 20462069
DOI: 10.1039/c6ra03383k
Rights: Attribution 4.0 International
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