Please use this identifier to cite or link to this item: https://doi.org/10.1039/c6ra03383k
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dc.titleRapid thermal annealing assisted stability and efficiency enhancement in a sputter deposited CuO photocathode†
dc.contributor.authorMasudy-Panah, S
dc.contributor.authorSiavash Moakhar, R
dc.contributor.authorChua, C.S
dc.contributor.authorKushwaha, A
dc.contributor.authorWong, T.I
dc.contributor.authorDalapati, G.K
dc.date.accessioned2020-10-26T08:26:38Z
dc.date.available2020-10-26T08:26:38Z
dc.date.issued2016
dc.identifier.citationMasudy-Panah, S, Siavash Moakhar, R, Chua, C.S, Kushwaha, A, Wong, T.I, Dalapati, G.K (2016). Rapid thermal annealing assisted stability and efficiency enhancement in a sputter deposited CuO photocathode†. RSC Advances 6 (35) : 29383-29390. ScholarBank@NUS Repository. https://doi.org/10.1039/c6ra03383k
dc.identifier.issn20462069
dc.identifier.urihttps://scholarbank.nus.edu.sg/handle/10635/180295
dc.description.abstractWe designed a stable and efficient CuO based photocathode by tuning the crystallinity and surface morphology of films by rapid thermal treatment. The role of the annealing temperature on film crystallinity, optical absorption and grain size is studied. The impact of these parameters upon the photocatalytic water splitting performance of CuO films is investigated. We observed that a higher annealing temperature improves the film crystallinity and increases the grain size of CuO film, which significantly enhance the photocurrent generation capability. Rapid thermal annealing at 550 C is found the best temperature to achieve the highest PEC performance. The thickness of the CuO photocathodes is also optimized and we observed that 550 nm thick films results in the highest photocurrent of 1.68 mA cm2. Our optimized CuO photocathode has shown better stability against photo-corrosion and a 30% decrease in the initial value of photocurrent is measured after 15 min, while a 60% decrease in the photocurrent is noticed in case of the as-deposited film. © The Royal Society of Chemistry 2016.
dc.rightsAttribution 4.0 International
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.sourceUnpaywall 20201031
dc.subjectCorrosion
dc.subjectField emission cathodes
dc.subjectGrain size and shape
dc.subjectLight absorption
dc.subjectPhotocathodes
dc.subjectPhotocurrents
dc.subjectRapid thermal annealing
dc.subjectThick films
dc.subjectAnnealing temperatures
dc.subjectAs-deposited films
dc.subjectCrystallinities
dc.subjectEfficiency enhancement
dc.subjectFilm crystallinity
dc.subjectPhotocatalytic water splitting
dc.subjectPhotocurrent generations
dc.subjectRapid thermal treatment
dc.subjectCopper oxides
dc.typeArticle
dc.contributor.departmentELECTRICAL AND COMPUTER ENGINEERING
dc.description.doi10.1039/c6ra03383k
dc.description.sourcetitleRSC Advances
dc.description.volume6
dc.description.issue35
dc.description.page29383-29390
dc.published.statePublished
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