Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
 
 
Email
eletaya@nus.edu.sg
 

Publications

Refined By:
Author:  Tay, A.
Subject:  Semiconductor manufacturing

Results 1-11 of 11 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
11-Aug-2006A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithographyHu, N.; Tay, A. ; Tsai, K.-Y.
2Feb-2007An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.
3Feb-2004Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturingTay, A. ; Ho, W.K. ; Schaper, C.D.; Lee, L.L.
415-Jan-2006Control of photoresist film thickness: Iterative feedback tuning approachTay, A. ; Khuen Ho, W. ; Deng, J.; Keng Lok, B.
5Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
62005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
72000Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quatz photomasksHo, W.K. ; Tay, A. 
82000Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quatz photomasksHo, W.K. ; Tay, A. 
9Jul-2004On control of resist film uniformity in the microlithography processHo, W.K. ; Tay, A. ; Lee, L.L.; Schaper, C.D.
102006Robust real-time thin film thickness estimationKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Lee, J.H.
112002Run-to-run process control for chemical mechanical polishing in semiconductor manufacturingDa, L.; Kumar, V.G.; Tay, A. ; Al Mamun, A. ; Ho, W.K. ; See, A.; Chan, L.