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Ee Beng, Arthur Tay

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Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
Main Affiliation
 
Faculty
 
Email
eletaya@nus.edu.sg
 

Publications

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Author:  Tay, A.
Author:  Wu, X.

Results 1-12 of 12 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
1Apr-2009A heater plate assisted bake/chill system for photoresist processing in photolithographyChua, H.T.; Tay, A. ; Wang, Y.; Wu, X.
22006A lamp thermoelectricity based integrated bake/chill system for advanced photoresist processingTay, A. ; Chua, H.-T.; Wu, X.; Wang, Y.
3Feb-2007A lamp thermoelectricity based integrated bake/chill system for photoresist processingTay, A. ; Chua, H.T.; Wu, X.
4Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
52004In-situ measurement and control for photoresist processing in microlithographyTay, A. ; Ho, W.-K. ; Wu, X.; Kiew, C.-M.
62009In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequenceWu, X.; Yang, G.; Lim, E.-X.; Tay, A. 
72007In-situ monitoring of photoresist thickness contourHo, W.K. ; Wu, X.; Tay, A. ; Chen, X.
82007Influence of wafer warpage on photoresist film thickness and extinction coefficient measurementsWu, X.; Tay, A. 
92005Real-time control of photoresist absorption coefficient uniformityTay, A. ; Ho, W.-K. ; Wu, X.; Tsai, K.-Y.
10Jan-2007Real-time control of photoresist extinction coefficient uniformity in the microlithography processTay, A. ; Ho, W.K. ; Wu, X.
112007Real-time estimation and control of photoresist properties in microlithographyWu, X.; Tay, A. ; Ho, W.K. ; Tan, K.K. 
122006Real-time monitoring of photoresist thickness contour in microlithographyHo, W.K. ; Chen, X.; Wu, X.; Tay, A.