1. ScholarBank@NUS

Ee Beng, Arthur Tay

rp04194

Collaboration Map View Statistics Email Alert RSS Feed

Profile

Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
Main Affiliation
 
Faculty
 
Email
eletaya@nus.edu.sg
 

Publications

Refined By:
Author:  Tay, A.
Date Issued:  [2000 TO 2009]
Subject:  Temperature control

Results 1-19 of 19 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
1Apr-2009A heater plate assisted bake/chill system for photoresist processing in photolithographyChua, H.T.; Tay, A. ; Wang, Y.; Wu, X.
2Feb-2007A lamp thermoelectricity based integrated bake/chill system for photoresist processingTay, A. ; Chua, H.T.; Wu, X.
3Feb-2007An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.
42008CD uniformity control via real-time control of photoresist propertiesChen, M.; Fu, J. ; Ho, W.K. ; Tay, A. 
5Feb-2004Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturingTay, A. ; Ho, W.K. ; Schaper, C.D.; Lee, L.L.
615-Jan-2006Control of photoresist film thickness: Iterative feedback tuning approachTay, A. ; Khuen Ho, W. ; Deng, J.; Keng Lok, B.
72005In-situ fault detection of wafer warpage in lithographyTay, A. ; Ho, W.K. ; Yap, C. ; Wei, C.; Tsai, K.-Y.
82005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
92009In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequenceWu, X.; Yang, G.; Lim, E.-X.; Tay, A. 
102008In-situ real-time temperature control of baking systems in lithographyWang, Y.; Chua, H.-T.; Tay, A. 
11Nov-2001Minimum time control of conductive heating systems for microelectronics processingTay, A. ; Ho, W.K. ; Poh, Y.P.
122000Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quatz photomasksHo, W.K. ; Tay, A. 
132000Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quatz photomasksHo, W.K. ; Tay, A. 
14Jul-2004On control of resist film uniformity in the microlithography processHo, W.K. ; Tay, A. ; Lee, L.L.; Schaper, C.D.
152005Real-time control of photoresist absorption coefficient uniformityTay, A. ; Ho, W.-K. ; Wu, X.; Tsai, K.-Y.
162005Real-time control of photoresist development processTay, A. ; Ho, W.-K. ; Kiew, C.-M.; Zhou, Y.; Lee, J.H.
17Jan-2007Real-time control of photoresist extinction coefficient uniformity in the microlithography processTay, A. ; Ho, W.K. ; Wu, X.
182007Real-time spatial control of photoresist development rateTay, A. ; Ho, W.-K. ; Hu, N.; Kiew, C.-M.; Tsai, K.-Y.
192001Spatially-programmable thermal processing module for 300 mm wafer processingTay, A. ; Khiang Wee Lim; Ai Poh Loh; Woei Wan Tan; Weng Khuen Ho; Huang, A. ; Fu, J.