Full Name
Chiam Sher-Yi
(not current staff)
Variants
Chiam, S.-Y.
Sher-Yi, C.
Chiam, S.Y.
 
Main Affiliation
 
Faculty
 
Email
phycsy@nus.edu.sg
 

Publications

Refined By:
Author:  Osipowicz, T.

Results 1-9 of 9 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
12-Sep-1999Channeling contrast microscopy of GaN and InGaN thin filmsOsipowicz, T. ; Chiam, S.Y. ; Watt, F. ; Li, G.; Chua, S.J.
27-Aug-2000Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2Lee, Y.K.; Maung Latt, K.; Li, S.; Osipowicz, T. ; Chiam, S.Y. 
329-Sep-2000Comparative analysis and study of ionized metal plasma (IMP)-Cu and chemical vapor deposition (CVD)-Cu on diffusion barrier properties of IMP-TaN on SiO2Lee, Y.K.; Latt, K.M.; JaeHyung, K.; Osipowicz, T. ; Sher-Yi, C. ; Lee, K.
41-Dec-2001Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structureLatt, K.M.; Sher-Yi, C. ; Osipowicz, T. ; Lee, K.; Lee, Y.K.
51-Jul-2009Proton beam writing and electroplating for the fabrication of high aspect ratio Au microstructuresYue, W. ; Ren, Y.; van Kan, J.A. ; Chiam, S.-Y. ; Jian, L. ; Moser, H.O. ; Osipowicz, T. ; Watt, F. 
6Jul-2007Sidewall quality in proton beam writingChiam, S.Y. ; van Kan, J.A. ; Osipowicz, T. ; Udalagama, C.N.B. ; Watt, F. 
7Jun-2000Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structureLee, Y.K.; Latt, K.M.; Osipowicz, T. ; Sher-Yi, C. 
8Dec-2000Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structureLee, Y.K.; Latt, K.M.; Jaehyung, K.; Osipowicz, T. ; Chiam, S.-Y. ; Lee, K.
91-Aug-2008The fabrication of x-ray masks using proton beam writingYue, W. ; Chiam, S.-Y. ; Ren, Y.; Van Kan, J.A. ; Osipowicz, T. ; Jian, L. ; Moser, H.O. ; Watt, F.