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|Title:||Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films||Authors:||Fan, H.J.
|Issue Date:||15-Jul-2003||Citation:||Fan, H.J., Kuok, M.H., Ng, S.C., Lim, H.S., Liu, N.N., Boukherroub, R., Lockwood, D.J. (2003-07-15). Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films. Journal of Applied Physics 94 (2) : 1243-1247. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1583148||Abstract:||The effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films were analyzed. The acoustic mode frequencies were observed to decrease with increasing oxidation time. The dependence of the surface and bulk acoustic mode frequencies on the natural oxidation time allows the evaluation of these wave frequencies for a porous silica glass film.||Source Title:||Journal of Applied Physics||URI:||http://scholarbank.nus.edu.sg/handle/10635/96369||ISSN:||00218979||DOI:||10.1063/1.1583148|
|Appears in Collections:||Staff Publications|
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