Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1583148
DC FieldValue
dc.titleEffects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films
dc.contributor.authorFan, H.J.
dc.contributor.authorKuok, M.H.
dc.contributor.authorNg, S.C.
dc.contributor.authorLim, H.S.
dc.contributor.authorLiu, N.N.
dc.contributor.authorBoukherroub, R.
dc.contributor.authorLockwood, D.J.
dc.date.accessioned2014-10-16T09:22:38Z
dc.date.available2014-10-16T09:22:38Z
dc.date.issued2003-07-15
dc.identifier.citationFan, H.J., Kuok, M.H., Ng, S.C., Lim, H.S., Liu, N.N., Boukherroub, R., Lockwood, D.J. (2003-07-15). Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films. Journal of Applied Physics 94 (2) : 1243-1247. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1583148
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/96369
dc.description.abstractThe effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films were analyzed. The acoustic mode frequencies were observed to decrease with increasing oxidation time. The dependence of the surface and bulk acoustic mode frequencies on the natural oxidation time allows the evaluation of these wave frequencies for a porous silica glass film.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1583148
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1063/1.1583148
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume94
dc.description.issue2
dc.description.page1243-1247
dc.description.codenJAPIA
dc.identifier.isiut000183842200061
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