Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films

Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1583148

Title:	Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films
Authors:	Fan, H.J. Kuok, M.H. Ng, S.C. Lim, H.S. Liu, N.N. Boukherroub, R. Lockwood, D.J.
Issue Date:	15-Jul-2003
Citation:	Fan, H.J., Kuok, M.H., Ng, S.C., Lim, H.S., Liu, N.N., Boukherroub, R., Lockwood, D.J. (2003-07-15). Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films. Journal of Applied Physics 94 (2) : 1243-1247. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1583148
Abstract:	The effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films were analyzed. The acoustic mode frequencies were observed to decrease with increasing oxidation time. The dependence of the surface and bulk acoustic mode frequencies on the natural oxidation time allows the evaluation of these wave frequencies for a porous silica glass film.
Source Title:	Journal of Applied Physics
URI:	http://scholarbank.nus.edu.sg/handle/10635/96369
ISSN:	00218979
DOI:	10.1063/1.1583148
Appears in Collections:	Staff Publications

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