Line defects embedded in three-dimensional photonic crystals

Abstract

An efficient method for embedding micrometer-scale line defects in the interior of self-assembled three-dimensional photonic crystals was developed. Monodisperse colloidal silica microspheres were assembled on a silicon substrate via a vertical deposition method to form a colloidal-crystal film. Photoresist patterns were constructed on the surface of the silica opal film via conventional optical photolithography technique. Replication of the silica colloidal crystal with carbon and removal of photoresist lines resulted in a carbon photonic crystal with air-core line defects embedded in its interior.