Please use this identifier to cite or link to this item: https://doi.org/10.1002/adma.200500047
DC FieldValue
dc.titleLine defects embedded in three-dimensional photonic crystals
dc.contributor.authorYan, Q.
dc.contributor.authorZhou, Z.
dc.contributor.authorZhao, X.S.
dc.contributor.authorChua, S.J.
dc.date.accessioned2014-10-09T06:52:32Z
dc.date.available2014-10-09T06:52:32Z
dc.date.issued2005-08-04
dc.identifier.citationYan, Q., Zhou, Z., Zhao, X.S., Chua, S.J. (2005-08-04). Line defects embedded in three-dimensional photonic crystals. Advanced Materials 17 (15) : 1917-1920. ScholarBank@NUS Repository. https://doi.org/10.1002/adma.200500047
dc.identifier.issn09359648
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/89331
dc.description.abstractAn efficient method for embedding micrometer-scale line defects in the interior of self-assembled three-dimensional photonic crystals was developed. Monodisperse colloidal silica microspheres were assembled on a silicon substrate via a vertical deposition method to form a colloidal-crystal film. Photoresist patterns were constructed on the surface of the silica opal film via conventional optical photolithography technique. Replication of the silica colloidal crystal with carbon and removal of photoresist lines resulted in a carbon photonic crystal with air-core line defects embedded in its interior.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1002/adma.200500047
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.contributor.departmentCHEMICAL & BIOMOLECULAR ENGINEERING
dc.description.doi10.1002/adma.200500047
dc.description.sourcetitleAdvanced Materials
dc.description.volume17
dc.description.issue15
dc.description.page1917-1920
dc.description.codenADVME
dc.identifier.isiut000231181800023
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