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|Title:||Growth and characterization of LiNiVO4 thin film cathode by pulsed laser deposition||Authors:||Tang, S.B.
LiNiVO4 thin film
Pulsed laser deposition
|Issue Date:||29-Feb-2008||Citation:||Tang, S.B., Lai, M.O., Lu, L. (2008-02-29). Growth and characterization of LiNiVO4 thin film cathode by pulsed laser deposition. Thin Solid Films 516 (8) : 1693-1698. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2007.05.017||Abstract:||Crystallized LiNiVO4 thin films have been prepared by pulsed laser deposition and their physical and electrochemical properties have been studied. With the increase of deposition temperatures and oxygen pressures, the crystallization became better, but accompanied with large sizes of grains. The initial discharge capacity of the film deposited at 873 K and 40 Pa of oxygen was just around 7.2 μA h/cm2 μm when it was cycled between 3.0 and 4.8 V with a current density of 10 μA h/cm2. Cyclic voltammetry at a sweep rate of 0.1 mV/s showed a main anodic peak at 4.20 V, a weak anodic peak at 4.59 V and a cathodic peak located at 3.73 V. Based on the linear relationship between the peak currents of cathodic peaks and the square roots of scan rates, the diffusion coefficient was estimated to be about 2.3 × 10- 15 cm2/s. Electrochemical impedance spectra revealed high charge-transfer resistance of Li-ion, such as about 9000 Ω at 4.0 V. The extremely slow Li-ion diffusion and high charge-transfer resistance indicate that the electrochemical reaction in LiNiVO4 thin films is sluggish. © 2007 Elsevier B.V. All rights reserved.||Source Title:||Thin Solid Films||URI:||http://scholarbank.nus.edu.sg/handle/10635/85250||ISSN:||00406090||DOI:||10.1016/j.tsf.2007.05.017|
|Appears in Collections:||Staff Publications|
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