Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.tsf.2007.05.017
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dc.titleGrowth and characterization of LiNiVO4 thin film cathode by pulsed laser deposition
dc.contributor.authorTang, S.B.
dc.contributor.authorLai, M.O.
dc.contributor.authorLu, L.
dc.date.accessioned2014-10-07T09:05:48Z
dc.date.available2014-10-07T09:05:48Z
dc.date.issued2008-02-29
dc.identifier.citationTang, S.B., Lai, M.O., Lu, L. (2008-02-29). Growth and characterization of LiNiVO4 thin film cathode by pulsed laser deposition. Thin Solid Films 516 (8) : 1693-1698. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2007.05.017
dc.identifier.issn00406090
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/85250
dc.description.abstractCrystallized LiNiVO4 thin films have been prepared by pulsed laser deposition and their physical and electrochemical properties have been studied. With the increase of deposition temperatures and oxygen pressures, the crystallization became better, but accompanied with large sizes of grains. The initial discharge capacity of the film deposited at 873 K and 40 Pa of oxygen was just around 7.2 μA h/cm2 μm when it was cycled between 3.0 and 4.8 V with a current density of 10 μA h/cm2. Cyclic voltammetry at a sweep rate of 0.1 mV/s showed a main anodic peak at 4.20 V, a weak anodic peak at 4.59 V and a cathodic peak located at 3.73 V. Based on the linear relationship between the peak currents of cathodic peaks and the square roots of scan rates, the diffusion coefficient was estimated to be about 2.3 × 10- 15 cm2/s. Electrochemical impedance spectra revealed high charge-transfer resistance of Li-ion, such as about 9000 Ω at 4.0 V. The extremely slow Li-ion diffusion and high charge-transfer resistance indicate that the electrochemical reaction in LiNiVO4 thin films is sluggish. © 2007 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.tsf.2007.05.017
dc.sourceScopus
dc.subjectCapacity
dc.subjectCathode
dc.subjectCharge/discharge
dc.subjectLiNiVO4 thin film
dc.subjectPulsed laser deposition
dc.typeArticle
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1016/j.tsf.2007.05.017
dc.description.sourcetitleThin Solid Films
dc.description.volume516
dc.description.issue8
dc.description.page1693-1698
dc.description.codenTHSFA
dc.identifier.isiut000253872200008
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