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|Title:||Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers||Authors:||Chen, F.H.
|Issue Date:||15-May-2003||Citation:||Chen, F.H., Ng, V., Adeyeye, A.O. (2003-05-15). Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers. Journal of Applied Physics 93 (10 2) : 6605-6607. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1557243||Abstract:||The effects of postdeposition magnetic annealing on sputtered ferrmomagnet (FM)/antiferromagnet (AF) trilayers were investigated. The hysteresis loops revealed a one-sided plateau for unannealed samples. It was found that the increase in coercivity was attributed to the formation of NiFeMn alloy at the interfaces caused by annealing.||Source Title:||Journal of Applied Physics||URI:||http://scholarbank.nus.edu.sg/handle/10635/83679||ISSN:||00218979||DOI:||10.1063/1.1557243|
|Appears in Collections:||Staff Publications|
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