Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1557243
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dc.titleEffects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers
dc.contributor.authorChen, F.H.
dc.contributor.authorNg, V.
dc.contributor.authorAdeyeye, A.O.
dc.date.accessioned2014-10-07T04:43:56Z
dc.date.available2014-10-07T04:43:56Z
dc.date.issued2003-05-15
dc.identifier.citationChen, F.H., Ng, V., Adeyeye, A.O. (2003-05-15). Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers. Journal of Applied Physics 93 (10 2) : 6605-6607. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1557243
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/83679
dc.description.abstractThe effects of postdeposition magnetic annealing on sputtered ferrmomagnet (FM)/antiferromagnet (AF) trilayers were investigated. The hysteresis loops revealed a one-sided plateau for unannealed samples. It was found that the increase in coercivity was attributed to the formation of NiFeMn alloy at the interfaces caused by annealing.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1557243
dc.sourceScopus
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1063/1.1557243
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume93
dc.description.issue10 2
dc.description.page6605-6607
dc.description.codenJAPIA
dc.identifier.isiut000182822300060
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