Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1557243
Title: Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers
Authors: Chen, F.H.
Ng, V. 
Adeyeye, A.O. 
Issue Date: 15-May-2003
Citation: Chen, F.H., Ng, V., Adeyeye, A.O. (2003-05-15). Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers. Journal of Applied Physics 93 (10 2) : 6605-6607. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1557243
Abstract: The effects of postdeposition magnetic annealing on sputtered ferrmomagnet (FM)/antiferromagnet (AF) trilayers were investigated. The hysteresis loops revealed a one-sided plateau for unannealed samples. It was found that the increase in coercivity was attributed to the formation of NiFeMn alloy at the interfaces caused by annealing.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/83679
ISSN: 00218979
DOI: 10.1063/1.1557243
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