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https://doi.org/10.1063/1.1521579
| Title: | Laser-induced amorphization of silicon during pulsed-laser irradiation of Tin/Ti/polycrystalline silicon/SiO2/silicon | Authors: | Chong, Y.F. Pey, K.L. Wee, A.T.S. Thompson, M.O. Tung, C.H. See, A. |
Issue Date: | 11-Nov-2002 | Citation: | Chong, Y.F., Pey, K.L., Wee, A.T.S., Thompson, M.O., Tung, C.H., See, A. (2002-11-11). Laser-induced amorphization of silicon during pulsed-laser irradiation of Tin/Ti/polycrystalline silicon/SiO2/silicon. Applied Physics Letters 81 (20) : 3786-3788. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1521579 | Abstract: | A report on the complex solidification structures formed during laser thermal processing (LTP) of a titanium nitride/titanium/polycrystalline silicon/silicon dioxide/silicon film stack was presented. The titanium atoms were found to diffuse through the entire polycrystalline silicon layer during irradiation. The results showed that a thick a-Si layer was formed upon LTP in the presence of titanium. | Source Title: | Applied Physics Letters | URI: | http://scholarbank.nus.edu.sg/handle/10635/82609 | ISSN: | 00036951 | DOI: | 10.1063/1.1521579 |
| Appears in Collections: | Staff Publications |
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