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|Title:||A novel experimental technique for the lateral profiling of oxide and interface state charges in hot-hole degraded N-MOSFET's||Authors:||Ang, D.S.
|Keywords:||Charge pumping current
Lateral profilig of trapped charges
|Issue Date:||Jan-1998||Citation:||Ang, D.S., Ling, C.H. (1998-01). A novel experimental technique for the lateral profiling of oxide and interface state charges in hot-hole degraded N-MOSFET's. IEEE Electron Device Letters 19 (1) : 23-25. ScholarBank@NUS Repository. https://doi.org/10.1109/55.650342||Abstract:||A new experimental techique, based on gate-to-drain capacitance Cgd s and charge pumping (CP) current, is proposed for the lateral profiling of oxide and interface state charges in the LDD region of the n-MOSFT's. The device is low-level chanel hot holes, which are subsequently removed by a low-level channel hot-electron stress. The deger of neutralization is monitored by Cgd s untill complete annihilation of trapped holes is realized. This allows the effects of oxide and interface state charges on CP characteristics to be clearly distinguished and the spatial profiles of the two charges to be seperately determined.||Source Title:||IEEE Electron Device Letters||URI:||http://scholarbank.nus.edu.sg/handle/10635/80281||ISSN:||07413106||DOI:||10.1109/55.650342|
|Appears in Collections:||Staff Publications|
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