Please use this identifier to cite or link to this item:
Title: Deep X-ray lithography in the fabrication process of a 3D diffractive optical element
Authors: Heussler, S.P. 
Moser, H.O. 
Quan, C.G. 
Tay, C.J. 
Moeller, K.D.
Bahou, M. 
Jian, L.K. 
Keywords: Diffractive optical element
Fourier transform spectroscopy
X-ray lithography
Issue Date: 2007
Citation: Heussler, S.P.,Moser, H.O.,Quan, C.G.,Tay, C.J.,Moeller, K.D.,Bahou, M.,Jian, L.K. (2007). Deep X-ray lithography in the fabrication process of a 3D diffractive optical element. AIP Conference Proceedings 879 : 1503-1506. ScholarBank@NUS Repository.
Abstract: We present first results of the fabrication process of a diffractive optical element (DOE) using deep X-ray lithography. The DOE forms the core of our proposed fast parallel-processing infrared Fourier transform interferometer (FPP FTIR) that works without moving parts and may allow instantaneous spectral analysis only limited by detector bandwidth. Design and specifications of the DOE are discussed. A fabrication process including deep X-ray lithography (DXRL) on stepped substrates is introduced. © 2007 American Institute of Physics.
Source Title: AIP Conference Proceedings
ISBN: 0735403732
ISSN: 0094243X
DOI: 10.1063/1.2436350
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.


checked on Jul 19, 2019

Page view(s)

checked on Jul 21, 2019

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.