Please use this identifier to cite or link to this item:
|Title:||Deep X-ray lithography in the fabrication process of a 3D diffractive optical element|
|Authors:||Heussler, S.P. |
|Keywords:||Diffractive optical element|
Fourier transform spectroscopy
|Citation:||Heussler, S.P.,Moser, H.O.,Quan, C.G.,Tay, C.J.,Moeller, K.D.,Bahou, M.,Jian, L.K. (2007). Deep X-ray lithography in the fabrication process of a 3D diffractive optical element. AIP Conference Proceedings 879 : 1503-1506. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2436350|
|Abstract:||We present first results of the fabrication process of a diffractive optical element (DOE) using deep X-ray lithography. The DOE forms the core of our proposed fast parallel-processing infrared Fourier transform interferometer (FPP FTIR) that works without moving parts and may allow instantaneous spectral analysis only limited by detector bandwidth. Design and specifications of the DOE are discussed. A fabrication process including deep X-ray lithography (DXRL) on stepped substrates is introduced. © 2007 American Institute of Physics.|
|Source Title:||AIP Conference Proceedings|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jan 18, 2019
checked on Dec 29, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.