Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2436350
Title: Deep X-ray lithography in the fabrication process of a 3D diffractive optical element
Authors: Heussler, S.P. 
Moser, H.O. 
Quan, C.G. 
Tay, C.J. 
Moeller, K.D.
Bahou, M. 
Jian, L.K. 
Keywords: Diffractive optical element
Fourier transform spectroscopy
X-ray lithography
Issue Date: 2007
Source: Heussler, S.P.,Moser, H.O.,Quan, C.G.,Tay, C.J.,Moeller, K.D.,Bahou, M.,Jian, L.K. (2007). Deep X-ray lithography in the fabrication process of a 3D diffractive optical element. AIP Conference Proceedings 879 : 1503-1506. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2436350
Abstract: We present first results of the fabrication process of a diffractive optical element (DOE) using deep X-ray lithography. The DOE forms the core of our proposed fast parallel-processing infrared Fourier transform interferometer (FPP FTIR) that works without moving parts and may allow instantaneous spectral analysis only limited by detector bandwidth. Design and specifications of the DOE are discussed. A fabrication process including deep X-ray lithography (DXRL) on stepped substrates is introduced. © 2007 American Institute of Physics.
Source Title: AIP Conference Proceedings
URI: http://scholarbank.nus.edu.sg/handle/10635/73306
ISBN: 0735403732
ISSN: 0094243X
DOI: 10.1063/1.2436350
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