Please use this identifier to cite or link to this item:
|Title:||Micro-rapid-prototyping via multi-layered photo-lithography||Authors:||Thian, S.C.H.
|Issue Date:||Jul-2006||Citation:||Thian, S.C.H., Tang, Y., Fuh, J.Y.H., Wong, Y.S., Lu, L., Loh, H.T. (2006-07). Micro-rapid-prototyping via multi-layered photo-lithography. International Journal of Advanced Manufacturing Technology 29 (9-10) : 1026-1032. ScholarBank@NUS Repository. https://doi.org/10.1007/s00170-005-2620-2||Abstract:||Rapid prototyping (RP) is widely used for part fabrication in the normal scale. For fabrication in micro-scale applications such as integrated circuit (IC), micro-electro-mechanical system (MEMS), methods such as surface and bulk machining are commonly used. This paper introduces a micro-fabrication technique using the RP principle, i.e., layered manufacturing, combined with mask-based micro-lithography, which is usually used in semiconductor industry. An ultraviolet (UV) excimer laser at the wavelength of 248 nm was used as the light source. A single piece of photo-mask carrying various patterns of multiple layers obtained from slicing a three dimensional (3D) micro-parts was employed for the lithography process. The preliminary results show that a certain RP photopolymer can be applied for the micro-RP, and solid layers with sharp edges can be formed from the liquid photopolymer identified. Using a unique alignment technique, a five layered gear of 1 mm in diameter has been successfully fabricated using the proposed method.||Source Title:||International Journal of Advanced Manufacturing Technology||URI:||http://scholarbank.nus.edu.sg/handle/10635/60752||ISSN:||02683768||DOI:||10.1007/s00170-005-2620-2|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Sep 13, 2019
WEB OF SCIENCETM
checked on Sep 5, 2019
checked on Sep 8, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.