Please use this identifier to cite or link to this item:
Title: Nano-patterning by pulsed laser irradiation in near field
Authors: Hong, M.H. 
Lin, Y. 
Chen, G.X. 
Tan, L.S. 
Xie, Q.
Lukyanchuk, B.
Shi, L.P.
Chong, T.C. 
Issue Date: 1-Apr-2007
Citation: Hong, M.H., Lin, Y., Chen, G.X., Tan, L.S., Xie, Q., Lukyanchuk, B., Shi, L.P., Chong, T.C. (2007-04-01). Nano-patterning by pulsed laser irradiation in near field. Journal of Physics: Conference Series 59 (1) : 64-67. ScholarBank@NUS Repository.
Abstract: Pulsed laser irradiation in near field is one of effective ways to break optical diffraction limit for surface nano-structuring. Femtosecond laser (400 nm, 100 fs) irradiation through near-field scanning optical microscopy for sub-50 nm resolution is studied. Application of transparent particles' mask by the self-assembly for nano-hole array fabrication is also investigated. It is attributed to light enhancement in near field through the particles. © 2007 IOP Publishing Ltd.
Source Title: Journal of Physics: Conference Series
ISSN: 17426588
DOI: 10.1088/1742-6596/59/1/014
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.