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|Title:||Nano-patterning by pulsed laser irradiation in near field||Authors:||Hong, M.H.
|Issue Date:||1-Apr-2007||Citation:||Hong, M.H., Lin, Y., Chen, G.X., Tan, L.S., Xie, Q., Lukyanchuk, B., Shi, L.P., Chong, T.C. (2007-04-01). Nano-patterning by pulsed laser irradiation in near field. Journal of Physics: Conference Series 59 (1) : 64-67. ScholarBank@NUS Repository. https://doi.org/10.1088/1742-6596/59/1/014||Abstract:||Pulsed laser irradiation in near field is one of effective ways to break optical diffraction limit for surface nano-structuring. Femtosecond laser (400 nm, 100 fs) irradiation through near-field scanning optical microscopy for sub-50 nm resolution is studied. Application of transparent particles' mask by the self-assembly for nano-hole array fabrication is also investigated. It is attributed to light enhancement in near field through the particles. © 2007 IOP Publishing Ltd.||Source Title:||Journal of Physics: Conference Series||URI:||http://scholarbank.nus.edu.sg/handle/10635/56761||ISSN:||17426588||DOI:||10.1088/1742-6596/59/1/014|
|Appears in Collections:||Staff Publications|
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