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https://doi.org/10.1088/1742-6596/59/1/014
Title: | Nano-patterning by pulsed laser irradiation in near field | Authors: | Hong, M.H. Lin, Y. Chen, G.X. Tan, L.S. Xie, Q. Lukyanchuk, B. Shi, L.P. Chong, T.C. |
Issue Date: | 1-Apr-2007 | Citation: | Hong, M.H., Lin, Y., Chen, G.X., Tan, L.S., Xie, Q., Lukyanchuk, B., Shi, L.P., Chong, T.C. (2007-04-01). Nano-patterning by pulsed laser irradiation in near field. Journal of Physics: Conference Series 59 (1) : 64-67. ScholarBank@NUS Repository. https://doi.org/10.1088/1742-6596/59/1/014 | Abstract: | Pulsed laser irradiation in near field is one of effective ways to break optical diffraction limit for surface nano-structuring. Femtosecond laser (400 nm, 100 fs) irradiation through near-field scanning optical microscopy for sub-50 nm resolution is studied. Application of transparent particles' mask by the self-assembly for nano-hole array fabrication is also investigated. It is attributed to light enhancement in near field through the particles. © 2007 IOP Publishing Ltd. | Source Title: | Journal of Physics: Conference Series | URI: | http://scholarbank.nus.edu.sg/handle/10635/56761 | ISSN: | 17426588 | DOI: | 10.1088/1742-6596/59/1/014 |
Appears in Collections: | Staff Publications |
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