Please use this identifier to cite or link to this item: https://doi.org/1/014
Title: Nano-patterning by pulsed laser irradiation in near field
Authors: Hong, M.H. 
Lin, Y. 
Chen, G.X. 
Tan, L.S. 
Xie, Q.
Lukyanchuk, B.
Shi, L.P.
Chong, T.C. 
Issue Date: 1-Apr-2007
Source: Hong, M.H.,Lin, Y.,Chen, G.X.,Tan, L.S.,Xie, Q.,Lukyanchuk, B.,Shi, L.P.,Chong, T.C. (2007-04-01). Nano-patterning by pulsed laser irradiation in near field. Journal of Physics: Conference Series 59 (1) : 64-67. ScholarBank@NUS Repository. https://doi.org/1/014
Abstract: Pulsed laser irradiation in near field is one of effective ways to break optical diffraction limit for surface nano-structuring. Femtosecond laser (400 nm, 100 fs) irradiation through near-field scanning optical microscopy for sub-50 nm resolution is studied. Application of transparent particles' mask by the self-assembly for nano-hole array fabrication is also investigated. It is attributed to light enhancement in near field through the particles. © 2007 IOP Publishing Ltd.
Source Title: Journal of Physics: Conference Series
URI: http://scholarbank.nus.edu.sg/handle/10635/56761
ISSN: 17426588
DOI: 1/014
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