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|Title:||Micro/nanomanufacturing in support of materials science||Authors:||Jian, L.K.
Bin Mahmood, S.
|Issue Date:||2009||Citation:||Jian, L.K.,Moser, H.O.,Chen, A.,Heussler, S.P.,Liu, G.,Bin Mahmood, S.,Kalaiselvi, S.M.P.,Maniam, S.M.,Virasawmy, S.,Ren, Y.P.,Barrett, M.D.,Dhanapaul, A.L. (2009). Micro/nanomanufacturing in support of materials science. AIP Conference Proceedings 1092 : 116-119. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3086203||Abstract:||With its LiMiNT facility (Lithography for Micro- and Nanotechnology), Singapore Synchrotron Light Source (SSLS) provides a one-stop shop for micro/nano fabrication on large areas (typically 4" diameter). Synchrotron deep X-ray lithography, eventually enhanced by the super-resolution process, is used to simultaneously pattern large numbers of micro/nano structures into a resist. Laser direct writer or electron beam serve as primary pattern generators, in particular, for mask making. Structure heights of >1mm, aspect ratios of >200, and minimum sizes of <200 nm have been achieved, not necessarily simultaneously. Such structures may be replicated into a variety of metals and plastics. Tilting, rotating of the mask-substrate stack during exposure enables the parallel production of nearly 3D structures. Application fields include electromagnetic metamaterials, X-ray and infrared optics, photonics, lasers, quantum technology, precision manufacturing, and fluidics. SSLS is serving a growing community of users and customers. © 2009 American Institute of Physics.||Source Title:||AIP Conference Proceedings||URI:||http://scholarbank.nus.edu.sg/handle/10635/53300||ISSN:||0094243X||DOI:||10.1063/1.3086203|
|Appears in Collections:||Staff Publications|
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