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https://scholarbank.nus.edu.sg/handle/10635/34885
| Title: | Low work function metal alloy | Authors: | YU HONGYU JINGDE CHEN N. MINGFU LI N. KWONG DIM-LEE BIESEMANS SERGE KITTL JORGE ADRIAN |
Issue Date: | 15-Nov-2006 | Citation: | YU HONGYU,JINGDE CHEN N.,MINGFU LI N.,KWONG DIM-LEE,BIESEMANS SERGE,KITTL JORGE ADRIAN (2006-11-15). Low work function metal alloy. ScholarBank@NUS Repository. | Abstract: | The present invention discloses low work function metals for use as gate electrode in nMOS devices. An alloy of lanthanide(s), metal and semiconductor is provided. In particular an alloy of Nickel-Ytterbium (NiYb) is used to fully silicide (FUSI) a silicon gate. The resulting Nickel-Ytterbium-Silicon gate electrode has a work function of about 4.22eV. | URI: | http://scholarbank.nus.edu.sg/handle/10635/34885 |
| Appears in Collections: | Staff Publications |
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| File | Description | Size | Format | Access Settings | Version | |
|---|---|---|---|---|---|---|
| EP1722404A2.pdf | 1.15 MB | Adobe PDF | OPEN | Published | View/Download |
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