Apparatus for CFC-free laser surface cleaning

Abstract

An apparatus for dry cleaning a surface includes a laser generator, a laser beam homogenizer, an aperture and a lens that are controlled by a CPU. The laser is preferably a KrF excimer laser although any laser capable of generating a pulsed output in the ultraviolet spectrum may be used. The lens is preferably a plano-convex lens. Articles to be cleaned are placed on a conveyor that transports the article through the laser beam. The CPU can store parameters for optimizing removal of a particular contaminant. These parameters may include the frequency of the pulse beam generated by the laser, the shape of the aperture, the position of the lens is controlled by a stage, and the speed of the conveyor belt.