Please use this identifier to cite or link to this item:
https://doi.org/10.1063/1.2208271
| Title: | Evolution of Schottky barrier heights at Ni/HfO2interfaces | Authors: | Li, Q. Dong, Y.F. Feng, Y.P. Ong, C.K. Wang, S.J. Chai, J.W. Huan, A.C.H. |
Issue Date: | 2006 | Citation: | Li, Q., Dong, Y.F., Feng, Y.P., Ong, C.K., Wang, S.J., Chai, J.W., Huan, A.C.H. (2006). Evolution of Schottky barrier heights at Ni/HfO2interfaces. Applied Physics Letters 88 (22). ScholarBank@NUS Repository. https://doi.org/10.1063/1.2208271 | Source Title: | Applied Physics Letters | URI: | http://scholarbank.nus.edu.sg/handle/10635/28834 | ISSN: | 00036951 | DOI: | 10.1063/1.2208271 |
| Appears in Collections: | Staff Publications |
Show full item record
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.