Evolution of Schottky barrier heights at Ni/HfO2interfaces

Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2208271

Title:	Evolution of Schottky barrier heights at Ni/HfO2interfaces
Authors:	Li, Q. Dong, Y.F. Feng, Y.P. Ong, C.K. Wang, S.J. Chai, J.W. Huan, A.C.H.
Issue Date:	2006
Citation:	Li, Q., Dong, Y.F., Feng, Y.P., Ong, C.K., Wang, S.J., Chai, J.W., Huan, A.C.H. (2006). Evolution of Schottky barrier heights at Ni/HfO2interfaces. Applied Physics Letters 88 (22). ScholarBank@NUS Repository. https://doi.org/10.1063/1.2208271
Abstract:	The evolution of Schottky barrier heights (SBHs) at NiHf O2 n-Si stacks was studied by in situ x -ray photoemission. It was found that the n -SBH (or the effective work function) increases with thickness of the Ni overlayer and approaches 2.4 eV (or 4.9 eV) when metallic behavior of Ni overlayer is recovered. This is in good agreement with results of first-principles calculations. The effective work function of Ni in contact with Hf O2 was found different from that in vacuum by 0.3 eV. The interface dipole was induced by the weak interaction of Ni thin film and Hf O2 dielectric. © 2006 American Institute of Physics.
Source Title:	Applied Physics Letters
URI:	http://scholarbank.nus.edu.sg/handle/10635/28834
ISSN:	00036951
DOI:	10.1063/1.2208271
Appears in Collections:	Staff Publications

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