Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2208271
Title: Evolution of Schottky barrier heights at Ni/HfO2interfaces
Authors: Li, Q. 
Dong, Y.F.
Feng, Y.P. 
Ong, C.K. 
Wang, S.J.
Chai, J.W.
Huan, A.C.H.
Issue Date: 2006
Citation: Li, Q., Dong, Y.F., Feng, Y.P., Ong, C.K., Wang, S.J., Chai, J.W., Huan, A.C.H. (2006). Evolution of Schottky barrier heights at Ni/HfO2interfaces. Applied Physics Letters 88 (22). ScholarBank@NUS Repository. https://doi.org/10.1063/1.2208271
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/28834
ISSN: 00036951
DOI: 10.1063/1.2208271
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