Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2208271
Title: Evolution of Schottky barrier heights at Ni/HfO2interfaces
Authors: Li, Q. 
Dong, Y.F.
Feng, Y.P. 
Ong, C.K. 
Wang, S.J.
Chai, J.W.
Huan, A.C.H.
Issue Date: 2006
Citation: Li, Q., Dong, Y.F., Feng, Y.P., Ong, C.K., Wang, S.J., Chai, J.W., Huan, A.C.H. (2006). Evolution of Schottky barrier heights at Ni/HfO2interfaces. Applied Physics Letters 88 (22). ScholarBank@NUS Repository. https://doi.org/10.1063/1.2208271
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/28834
ISSN: 00036951
DOI: 10.1063/1.2208271
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

12
checked on May 13, 2018

WEB OF SCIENCETM
Citations

12
checked on Apr 24, 2018

Page view(s)

117
checked on May 12, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.