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https://doi.org/10.1038/s41699-021-00251-y
Title: | Efficient Ohmic contacts and built-in atomic sublayer protection in MoSi2N4 and WSi2N4 monolayers | Authors: | Wang, Qianqian Cao, Liemao Liang, Shi-Jun Wu, Weikang Wang, Guangzhao Lee, Ching Hua Ong, Wee Liat Yang, Hui Ying Ang, Lay Kee Yang, Shengyuan A. Ang, Yee Sin |
Issue Date: | 4-Aug-2021 | Publisher: | Nature Research | Citation: | Wang, Qianqian, Cao, Liemao, Liang, Shi-Jun, Wu, Weikang, Wang, Guangzhao, Lee, Ching Hua, Ong, Wee Liat, Yang, Hui Ying, Ang, Lay Kee, Yang, Shengyuan A., Ang, Yee Sin (2021-08-04). Efficient Ohmic contacts and built-in atomic sublayer protection in MoSi2N4 and WSi2N4 monolayers. npj 2D Materials and Applications 5 (1) : 71. ScholarBank@NUS Repository. https://doi.org/10.1038/s41699-021-00251-y | Rights: | Attribution 4.0 International | Abstract: | Metal contacts to two-dimensional (2D) semiconductors are often plagued by the strong Fermi level pinning (FLP) effect which reduces the tunability of the Schottky barrier height (SBH) and degrades the performance of 2D semiconductor devices. Here, we show that MoSi2N4 and WSi2N4 monolayers—an emerging 2D semiconductor family with exceptional physical properties—exhibit strongly suppressed FLP and wide-range tunable SBH. An exceptionally large SBH slope parameter of S ? 0.7 is obtained which outperforms the vast majority of other 2D semiconductors. Such intriguing behavior arises from the septuple-layered morphology of MoSi2N4 and WSi2N4 monolayers in which the semiconducting electronic states are protected by the outlying Si–N sublayer. We identify Ti, Sc, and Ni as highly efficient Ohmic contacts to MoSi2N4 and WSi2N4 with zero interface tunneling barrier. Our findings reveal the potential of MoSi2N4 and WSi2N4 as a practical platform for designing high-performance and energy-efficient 2D semiconductor electronic devices. © 2021, The Author(s). | Source Title: | npj 2D Materials and Applications | URI: | https://scholarbank.nus.edu.sg/handle/10635/231924 | ISSN: | 2397-7132 | DOI: | 10.1038/s41699-021-00251-y | Rights: | Attribution 4.0 International |
Appears in Collections: | Elements Staff Publications |
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