Please use this identifier to cite or link to this item: https://doi.org/10.1038/lsa.2014.66
Title: Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing
Authors: Yang J. 
Luo F. 
Kao T.S. 
Li X.
Ho G.W. 
Teng J., Luo X.
Hong M. 
Keywords: Aspect ratio
Fabrication
Light reflection
Lithography
Nanowires
Optical waveguides
Optoelectronic devices
Plasmons
Reflection
Refractive index
Surface plasmon resonance
Anti reflection
broadband
Broadband anti reflections
Laser interference lithography
Light collection efficiency
Metal-assisted chemical etching
Sub-wavelength structures
Surface plasmons
Broadband
Silicon
Issue Date: 2014
Citation: Yang J., Luo F., Kao T.S., Li X., Ho G.W., Teng J., Luo X., Hong M. (2014). Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing. Light: Science and Applications 3 : e185. ScholarBank@NUS Repository. https://doi.org/10.1038/lsa.2014.66
Abstract: Light collection efficiency is an important factor that affects the performance of many optical and optoelectronic devices. In these devices, the high reflectivity of interfaces can hinder efficient light collection. To minimize unwanted reflection, anti-reflection surfaces can be fabricated by micro/nanopatterning. In this paper, we investigate the fabrication of broadband anti-reflection Si surfaces by laser micro/nanoprocessing. Laser direct writing is applied to create microstructures on Si surfaces that reduce light reflection by light trapping. In addition, laser interference lithography and metal assisted chemical etching are adopted to fabricate the Si nanowire arrays. The anti-reflection performance is greatly improved by the high aspect ratio subwavelength structures, which create gradients of refractive index from the ambient air to the substrate. Furthermore, by decoration of the Si nanowires with metallic nanoparticles, surface plasmon resonance can be used to further control the broadband reflections, reducing the reflection to below 1.0% across from 300 to 1200 nm. An average reflection of 0.8% is achieved. © 2014 CIOMP.
Source Title: Light: Science and Applications
URI: https://scholarbank.nus.edu.sg/handle/10635/174580
ISSN: 2047-7538
DOI: 10.1038/lsa.2014.66
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