Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.apsusc.2014.11.180
Title: Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation
Authors: Meddeb, H
Bearda, T
Payo, M Recaman
Abdelwahab, I 
Abdulraheem, Y
Ezzaouia, H
Gordon, I
Szlufcik, J
Poortmans, J
Keywords: Science & Technology
Physical Sciences
Technology
Chemistry, Physical
Materials Science, Coatings & Films
Physics, Applied
Physics, Condensed Matter
Chemistry
Materials Science
Physics
Wet chemical cleaning
Surface treatment
Intrinsic amorphous silicon
Boron emitter
Passivat ion
Annealing
P-TYPE
RECOMBINATION
INTERFACES
Issue Date: 15-Feb-2015
Publisher: ELSEVIER
Citation: Meddeb, H, Bearda, T, Payo, M Recaman, Abdelwahab, I, Abdulraheem, Y, Ezzaouia, H, Gordon, I, Szlufcik, J, Poortmans, J (2015-02-15). Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation. APPLIED SURFACE SCIENCE 328 : 140-145. ScholarBank@NUS Repository. https://doi.org/10.1016/j.apsusc.2014.11.180
Abstract: © 2014 Elsevier B.V. All rights reserved. The influence of the cleaning process on the amorphous silicon passivation of homojunction emitters is investigated. A significant variation in the passivation quality following different cleaning sequences is not observed, even though differences in cleaning performance are evident. These results point out the effectiveness of our cleaning treatment and provide a hydrogen termination for intrinsic amorphous silicon passivation. A post-deposition treatment improves the passivation level yielding emitter saturation currents determined by Auger recombination in the order of 70 fA/cm 2 and below.
Source Title: APPLIED SURFACE SCIENCE
URI: https://scholarbank.nus.edu.sg/handle/10635/170787
ISSN: 0169-4332
1873-5584
DOI: 10.1016/j.apsusc.2014.11.180
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