Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/112972
Title: | Small area X-ray photoelectron spectroscopy (SAXPS) analysis of microscopic contamination in semiconductor materials and processes | Authors: | Marks, M.R. Kintrup, L. Bittigau, K. |
Issue Date: | Mar-1995 | Citation: | Marks, M.R.,Kintrup, L.,Bittigau, K. (1995-03). Small area X-ray photoelectron spectroscopy (SAXPS) analysis of microscopic contamination in semiconductor materials and processes. Vacuum 46 (3) : 281-286. ScholarBank@NUS Repository. | Abstract: | Microscopic contaminants occurring in the semiconductor manufacturing environment have been analysed using SAXPS. The molecular information obtained can be utilised to successfully identify and locate the sources of contamination. A description of the working principles of SAXPS and case studies in wafer fabrication and packaging assembly are presented. © 1995. | Source Title: | Vacuum | URI: | http://scholarbank.nus.edu.sg/handle/10635/112972 | ISSN: | 0042207X |
Appears in Collections: | Staff Publications |
Show full item record
Files in This Item:
There are no files associated with this item.
Google ScholarTM
Check
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.