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Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/112972
DC FieldValue
dc.titleSmall area X-ray photoelectron spectroscopy (SAXPS) analysis of microscopic contamination in semiconductor materials and processes
dc.contributor.authorMarks, M.R.
dc.contributor.authorKintrup, L.
dc.contributor.authorBittigau, K.
dc.date.accessioned2014-11-28T08:12:51Z
dc.date.available2014-11-28T08:12:51Z
dc.date.issued1995-03
dc.identifier.citationMarks, M.R.,Kintrup, L.,Bittigau, K. (1995-03). Small area X-ray photoelectron spectroscopy (SAXPS) analysis of microscopic contamination in semiconductor materials and processes. Vacuum 46 (3) : 281-286. ScholarBank@NUS Repository.
dc.identifier.issn0042207X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/112972
dc.description.abstractMicroscopic contaminants occurring in the semiconductor manufacturing environment have been analysed using SAXPS. The molecular information obtained can be utilised to successfully identify and locate the sources of contamination. A description of the working principles of SAXPS and case studies in wafer fabrication and packaging assembly are presented. © 1995.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentINSTITUTE OF MICROELECTRONICS
dc.description.sourcetitleVacuum
dc.description.volume46
dc.description.issue3
dc.description.page281-286
dc.description.codenVACUA
dc.identifier.isiutNOT_IN_WOS
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