Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/112972
Title: Small area X-ray photoelectron spectroscopy (SAXPS) analysis of microscopic contamination in semiconductor materials and processes
Authors: Marks, M.R. 
Kintrup, L.
Bittigau, K.
Issue Date: Mar-1995
Citation: Marks, M.R.,Kintrup, L.,Bittigau, K. (1995-03). Small area X-ray photoelectron spectroscopy (SAXPS) analysis of microscopic contamination in semiconductor materials and processes. Vacuum 46 (3) : 281-286. ScholarBank@NUS Repository.
Abstract: Microscopic contaminants occurring in the semiconductor manufacturing environment have been analysed using SAXPS. The molecular information obtained can be utilised to successfully identify and locate the sources of contamination. A description of the working principles of SAXPS and case studies in wafer fabrication and packaging assembly are presented. © 1995.
Source Title: Vacuum
URI: http://scholarbank.nus.edu.sg/handle/10635/112972
ISSN: 0042207X
Appears in Collections:Staff Publications

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