Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/107325
Title: X-ray analysis and microhardness characterization of TiN/Ti multilayers
Authors: Li, W. 
Gong, H. 
Cai, J. 
Wang, Y.
Issue Date: 20-Jan-2002
Citation: Li, W.,Gong, H.,Cai, J.,Wang, Y. (2002-01-20). X-ray analysis and microhardness characterization of TiN/Ti multilayers. International Journal of Modern Physics B 16 (1-2) : 275-280. ScholarBank@NUS Repository.
Abstract: TiN/Ti multilayers have been grown by using Hollow Cathode Discharge (HCD) ion plating and studied by x-ray diffraction analysis. Low-angle diffraction profile indicated the quasi-periodic structure. The parameters of the multilayer microstructure were obtained through x-ray double-line analysis on the high-angle profile. The results of the subgrain size Deff showed that the multilayer structure lead to grain refining. The microhardness of TiN was calculated following the idea of evaluating thin film microhardness by crystal plastic deformation. It was revealed that the multilayer microhardnesss could be improved by grain refining. Comparing the experimental values to the calculated data, the interface was found to be an important factor for the microhardness of TiN/Ti multiplayer film.
Source Title: International Journal of Modern Physics B
URI: http://scholarbank.nus.edu.sg/handle/10635/107325
ISSN: 02179792
Appears in Collections:Staff Publications

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