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Weng Khuen Ho

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Full Name
Weng Khuen Ho
Variants
Ho, W.-K.
Ho, Weng-Khuen
Khuen, Ho Weng
Ho, M.
Ho, Weng Khuen
Khuen Ho, W.
Ho, W.Y.
Khuen, H.W.
Ho, W.K.
 
Main Affiliation
 
Faculty
 
Email
elehowk@nus.edu.sg
 

Publications

Refined By:
Author:  Ho, W.K.
Department:  COLLEGE OF DESIGN AND ENGINEERING
Subject:  Semiconductor manufacturing

Results 1-11 of 11 (Search time: 0.003 seconds).

Issue DateTitleAuthor(s)
1Feb-2007An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.
2Feb-2004Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturingTay, A. ; Ho, W.K. ; Schaper, C.D.; Lee, L.L.
315-Jan-2006Control of photoresist film thickness: Iterative feedback tuning approachTay, A. ; Khuen Ho, W. ; Deng, J.; Keng Lok, B.
4Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
52005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
62000Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quatz photomasksHo, W.K. ; Tay, A. 
72000Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quatz photomasksHo, W.K. ; Tay, A. 
8May-2010Multi-zone thermal processing in semiconductor manufacturing: Bias estimationYan, H.; Ho, W.K. ; Ling, K.V.; Lim, K.W.
9Jul-2004On control of resist film uniformity in the microlithography processHo, W.K. ; Tay, A. ; Lee, L.L.; Schaper, C.D.
102006Robust real-time thin film thickness estimationKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Lee, J.H.
112002Run-to-run process control for chemical mechanical polishing in semiconductor manufacturingDa, L.; Kumar, V.G.; Tay, A. ; Al Mamun, A. ; Ho, W.K. ; See, A.; Chan, L.