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Gong Hao

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Full Name
Gong Hao
Variants
Hao, G.
Gong, Hao
Gong, H.
HAO, GONG
GONG, HAO
Gong H.
 
Main Affiliation
 
Faculty
 
Email
msegongh@nus.edu.sg
 

Publications

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Department:  MATERIALS SCIENCE
Author:  Gong, H.
Date Issued:  2002

Results 1-16 of 16 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
120-Jan-2002Annealing effects on contact properties of Aluminum doped Zinc Oxide thin filmsLow, K.B.; Gong, H. ; Chor, E.F. 
220-Jan-2002Crystal growth of Al-doped ZnO films under different sputtering conditionsGoh, E.G.; Gong, H. 
320-Jan-2002Crystal structure and gas sensing properties of Cu-doped zinc oxideOng, C.H.; Wang, J.H.; Gong, H. ; Chan, H.S.O. 
420-Jan-2002Crystal structure and properties of CU-Al-O thin filmsWang, Y. ; Gong, H. ; Liu, L. 
520-Jan-2002Crystallization and interfacial processes Proceeding of International Conference on Materials for Advanced Technologies 2001: PrefaceLiu, X.Y. ; Liu, X.Y.; Gong, H. ; Chen, B.-H. 
620-Jan-2002Crystallization and optoelectronic properties of indium-Zinc-Oxide thin films annealed in argon and vacuumChoy, S.F.; Gong, H. ; Zhu, F.
7Sep-2002Evaluation of commercial electroless nickel chemicals for a low cost wafer bumping processLu, H.; Kang, C.L.; Wong, S.C.K.; Gong, H. 
815-Nov-2002ITO thin films coated quartz crystal microbalance as gas sensor for NO detectionZhang, J.; Hu, J.Q.; Zhu, F.R.; Gong, H. ; O'Shea, S.J.
915-Sep-2002Kinetics and mechanisms of laser-induced decompositions of hydrogenated amorphous carbon films on magnetic hard disksZhang, L.H.; Gong, H. ; Wang, J.P. 
1015-Jun-2002Kinetics and mechanisms of the thermal degradation of amorphous carbon filmsZhang, L.H.; Gong, H. ; Wang, J.P. 
1120-Jan-2002Nano-crystal alloy and alloy-oxide coatings and their high-temperature corrosion propertiesGao, W.; Liu, Z.; Li, Z.; Li, S.S.; Gong, H. 
1220-Jan-2002Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperatureLiu, L. ; Gong, H. ; Wang, Y. ; Wee, A.T.S. ; Liu, R. 
1325-Nov-2002Suppressed crystallization of Hf-based gate dielectrics by controlled addition of Al2O3 using atomic layer depositionHo, M.-Y.; Gong, H. ; Wilk, G.D.; Busch, B.W.; Green, M.L.; Lin, W.H.; See, A.; Lahiri, S.K.; Loomans, M.E.; Räisänen, P.I.; Gustafsson, T.
14Jan-2002Theoretical study of Cr diffusion in Co-Cr alloy thin film recording mediaJin, D.; Wang, J.P.; Gong, H. 
154-Mar-2002Thermal decomposition kinetics of amorphous carbon nitride and carbon filmsZhang, L.H.; Gong, H. ; Wang, J.P. 
1620-Jan-2002X-ray analysis and microhardness characterization of TiN/Ti multilayersLi, W. ; Gong, H. ; Cai, J. ; Wang, Y.