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https://doi.org/10.1063/1.1466521
| Title: | Structural study of refractory-metal-free C40 TiSi2 and its transformation to C54 TiSi2 | Authors: | Yu, T. Tan, S.C. Shen, Z.X. Chen, L.W. Lin, J.Y. See, A.K. |
Issue Date: | 1-Apr-2002 | Citation: | Yu, T., Tan, S.C., Shen, Z.X., Chen, L.W., Lin, J.Y., See, A.K. (2002-04-01). Structural study of refractory-metal-free C40 TiSi2 and its transformation to C54 TiSi2. Applied Physics Letters 80 (13) : 2266-2268. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1466521 | Abstract: | The structure of laser-induced refractory-metal-free C40 TiSi2 has been studied by glancing-angle x-ray diffraction (GAXRD) in detail. The result shows that laser-induced C40 TiSi2 has a hexagonal structure with the P6222 space group and lattice parameters a=0.467 nm and c=0.662 nm. The ordering effect and the stress effect on the TiSi2 film are also discussed based on the GAXRD and micro-Raman results. The C40 phase completely transforms to the technologically important C54 phase at a relatively low temperature of 700°C. © 2002 American Institute of Physics. | Source Title: | Applied Physics Letters | URI: | http://scholarbank.nus.edu.sg/handle/10635/98063 | ISSN: | 00036951 | DOI: | 10.1063/1.1466521 |
| Appears in Collections: | Staff Publications |
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