Please use this identifier to cite or link to this item:
|Title:||Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition||Authors:||Liu, J.-M.
|Issue Date:||15-Nov-1998||Citation:||Liu, J.-M.,Ong, C.K. (1998-11-15). Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition. Journal of Applied Physics 84 (10) : 5560-5565. ScholarBank@NUS Repository.||Abstract:||A measurement of electrical conductivity and Hall effect has been made for thin film La0.5Sr0.5CoO3-δ (LSCO) prepared on (001) SrTiO3 substrates by pulsed laser deposition under reduced oxygen pressures. A considerable effect of oxygen stoichiometry on electrical resistivity of LSCO thin films has been observed. The semiconducting behavior was observed as long as the sample was slightly oxygen deficient. The Hall effect measurements revealed a change ranging from four to six orders of magnitude in the carrier density, from 1019 to 1015 cm-3 at room temperature, and 1020-1012 cm-3 at ∼80 K for the films prepared inbetween 1 bar and 1 μbar O2. A chemical equilibrium approach of the interaction between oxygen vacancies and hole carriers was used to explain the measured data. The results were compared with the microstructural measurements, yielding an empirical relation between the lattice expansion along c-axis and oxygen vacancies for LSCO films. © 1998 American Institute of Physics.||Source Title:||Journal of Applied Physics||URI:||http://scholarbank.nus.edu.sg/handle/10635/96332||ISSN:||00218979|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jun 6, 2020
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.