Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.916124
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dc.titleFast optical proximity correction with timing optimization ready standard cells
dc.contributor.authorQu, Y.
dc.contributor.authorHeng, C.H.
dc.contributor.authorTay, A.
dc.contributor.authorLee, T.H.
dc.date.accessioned2014-10-07T04:44:33Z
dc.date.available2014-10-07T04:44:33Z
dc.date.issued2012
dc.identifier.citationQu, Y., Heng, C.H., Tay, A., Lee, T.H. (2012). Fast optical proximity correction with timing optimization ready standard cells. Proceedings of SPIE - The International Society for Optical Engineering 8327 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.916124
dc.identifier.isbn9780819489838
dc.identifier.issn1996756X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/83733
dc.description.abstractResolution enhancement techniques (RET) such as optical proximity correction (OPC) has become an integral part of the fabrication of integrated circuits to maintain the edge placement integrity of the original circuit design. Conventional OPC schemes are usually shape driven and full chip based, resulting in unpredictability in electrical behavior and huge computational effort. To overcome these drawbacks, a new OPC methodology which is electrically driven and based on cell-wise optimization is proposed. Simulation results when compared to conventional OPC approaches in the literature demonstrate better timing accuracy with reduced mask cost. Depending of the circuit test-set, an average run-time improvement between 3 to 8 times is achieved for circuit size with 100 - 400 cells. Further improvements can be obtained by adopting a hybrid approach by only optimizing the timing performance of critical paths. For the hybrid approach, better timing accuracy can be achieved while incurring little penalty on mask cost. © 2012 Copyright SPIE.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.916124
dc.sourceScopus
dc.subjectcell-wise
dc.subjectdesign for manufacturability (DFM)
dc.subjectelectrical performance
dc.subjectOptical proximity correction (OPC)
dc.subjectstandard cell
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1117/12.916124
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume8327
dc.description.page-
dc.description.codenPSISD
dc.identifier.isiut000304902300034
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