Please use this identifier to cite or link to this item: https://doi.org/10.1149/1.1459682
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dc.titleSuppression of nitridation-induced interface traps and hole mobility degradation by nitrogen plasma nitridation
dc.contributor.authorAng, C.H.
dc.contributor.authorTan, S.S.
dc.contributor.authorLek, C.M.
dc.contributor.authorLin, W.
dc.contributor.authorZheng, Z.J.
dc.contributor.authorChen, T.
dc.contributor.authorCho, B.J.
dc.date.accessioned2014-10-07T04:37:29Z
dc.date.available2014-10-07T04:37:29Z
dc.date.issued2002-04
dc.identifier.citationAng, C.H., Tan, S.S., Lek, C.M., Lin, W., Zheng, Z.J., Chen, T., Cho, B.J. (2002-04). Suppression of nitridation-induced interface traps and hole mobility degradation by nitrogen plasma nitridation. Electrochemical and Solid-State Letters 5 (4) : G26-G28. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1459682
dc.identifier.issn10990062
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/83119
dc.description.abstractThe impact of nitrogen plasma nitridation on the interfacial quality of ultrathin oxides (1.8 and 2.6 nm) have been investigated and compared with NO nitridation. It is found that plasma-nitrided oxides are more immune to nitridation-induced degradation of channel hole mobility, and have lower intrinsic interface-trap density as compared to NO-nitrided oxides. In addition, plasma-nitrided oxides can further suppress hole mobility degradation induced by boron penetration. The superior performance of nitrogen plasma nitridation is attributed to its capability of incorporating a high level of nitrogen at the top oxide surface, while keeping the Si-SiO2 interface intact.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1149/1.1459682
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1149/1.1459682
dc.description.sourcetitleElectrochemical and Solid-State Letters
dc.description.volume5
dc.description.issue4
dc.description.pageG26-G28
dc.description.codenESLEF
dc.identifier.isiut000175314300016
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