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https://scholarbank.nus.edu.sg/handle/10635/75760
| Title: | Chromium deposition from trivalent chromium-thiocyanate bath | Authors: | Hsieh, An-Kong Chen, Keng-Nam Chung, Mei-Fatt |
Issue Date: | May-1994 | Citation: | Hsieh, An-Kong,Chen, Keng-Nam,Chung, Mei-Fatt (1994-05). Chromium deposition from trivalent chromium-thiocyanate bath. Metal Finishing 92 (5) : 11-15. ScholarBank@NUS Repository. | Abstract: | Deposition of chromium from a trivalent state using the thiocyanate bath has been studied. The electrochemistry of the process was investigated, and a reaction mechanism was tentatively proposed. In this report, the effects of electrolyte composition, current density, pH, and temperature were studied in detail to optimize the operational conditions, and the surface morphology and composition of the chromium deposit were analyzed. Trivalent chromium complexed with sodium thiocyanate was found to be able to produce bright chromium deposits on the base metal. Hull cell evaluation showed that trivalent chromium/thiocyanate in the ratio of 1:2-1:3 gave the best decorative coating. | Source Title: | Metal Finishing | URI: | http://scholarbank.nus.edu.sg/handle/10635/75760 | ISSN: | 00260576 |
| Appears in Collections: | Staff Publications |
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