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Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/75760
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dc.titleChromium deposition from trivalent chromium-thiocyanate bath
dc.contributor.authorHsieh, An-Kong
dc.contributor.authorChen, Keng-Nam
dc.contributor.authorChung, Mei-Fatt
dc.date.accessioned2014-06-23T05:34:19Z
dc.date.available2014-06-23T05:34:19Z
dc.date.issued1994-05
dc.identifier.citationHsieh, An-Kong,Chen, Keng-Nam,Chung, Mei-Fatt (1994-05). Chromium deposition from trivalent chromium-thiocyanate bath. Metal Finishing 92 (5) : 11-15. ScholarBank@NUS Repository.
dc.identifier.issn00260576
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/75760
dc.description.abstractDeposition of chromium from a trivalent state using the thiocyanate bath has been studied. The electrochemistry of the process was investigated, and a reaction mechanism was tentatively proposed. In this report, the effects of electrolyte composition, current density, pH, and temperature were studied in detail to optimize the operational conditions, and the surface morphology and composition of the chromium deposit were analyzed. Trivalent chromium complexed with sodium thiocyanate was found to be able to produce bright chromium deposits on the base metal. Hull cell evaluation showed that trivalent chromium/thiocyanate in the ratio of 1:2-1:3 gave the best decorative coating.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentCHEMISTRY
dc.contributor.departmentPHYSICS
dc.description.sourcetitleMetal Finishing
dc.description.volume92
dc.description.issue5
dc.description.page11-15
dc.description.codenMEFIA
dc.identifier.isiutNOT_IN_WOS
Appears in Collections:Staff Publications

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