Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/72519
DC Field | Value | |
---|---|---|
dc.title | Charging control using pulsed scanning electron microscopy | |
dc.contributor.author | Wong, W.K. | |
dc.contributor.author | Phang, J.C.H. | |
dc.contributor.author | Thong, J.T.L. | |
dc.date.accessioned | 2014-06-19T05:08:58Z | |
dc.date.available | 2014-06-19T05:08:58Z | |
dc.date.issued | 1995 | |
dc.identifier.citation | Wong, W.K.,Phang, J.C.H.,Thong, J.T.L. (1995). Charging control using pulsed scanning electron microscopy. Scanning 17 (5) : 312-315. ScholarBank@NUS Repository. | |
dc.identifier.issn | 01610457 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/72519 | |
dc.description.abstract | This paper describes a novel method to observe highly charging specimens at high beam voltages without specimen preparation. It is found that the technique greatly reduces charging artifacts such as image shift, astigmatism, and defocussing without sacrificing image quality. Images obtained of uncoated specimens are found to be comparable to gold coated specimens and without exhibiting charging effects. The technique also allows the study of charge distribution effects in specimen charging of which very little understanding exists, particularly as far as the spatial and time- dependent properties of charging are concerned. | |
dc.source | Scopus | |
dc.subject | beam pulsing | |
dc.subject | charging control | |
dc.subject | high-voltage SEM | |
dc.subject | image processing | |
dc.type | Conference Paper | |
dc.contributor.department | ELECTRICAL ENGINEERING | |
dc.description.sourcetitle | Scanning | |
dc.description.volume | 17 | |
dc.description.issue | 5 | |
dc.description.page | 312-315 | |
dc.description.coden | SCNND | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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