Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/245832
Title: FABRICATION AND CHARACTERIZATION OF FERROELECTRIC HF0.5ZR0.5O2 THIN FILMS
Authors: WU YICHEN
ORCID iD:   orcid.org/0009-0002-4413-1304
Keywords: Hafnia,Ferroelectricicty,Epitaxial growth,thin film,Oxygen vacancies,HZO
Issue Date: 16-Aug-2023
Citation: WU YICHEN (2023-08-16). FABRICATION AND CHARACTERIZATION OF FERROELECTRIC HF0.5ZR0.5O2 THIN FILMS. ScholarBank@NUS Repository.
URI: https://scholarbank.nus.edu.sg/handle/10635/245832
Appears in Collections:Master's Theses (Closed)

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