Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/245832
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dc.titleFABRICATION AND CHARACTERIZATION OF FERROELECTRIC HF0.5ZR0.5O2 THIN FILMS
dc.contributor.authorWU YICHEN
dc.date.accessioned2023-11-08T18:00:18Z
dc.date.available2023-11-08T18:00:18Z
dc.date.issued2023-08-16
dc.identifier.citationWU YICHEN (2023-08-16). FABRICATION AND CHARACTERIZATION OF FERROELECTRIC HF0.5ZR0.5O2 THIN FILMS. ScholarBank@NUS Repository.
dc.identifier.urihttps://scholarbank.nus.edu.sg/handle/10635/245832
dc.language.isoen
dc.subjectHafnia,Ferroelectricicty,Epitaxial growth,thin film,Oxygen vacancies,HZO
dc.typeThesis
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.contributor.supervisorJingsheng Chen
dc.description.degreeMaster's
dc.description.degreeconferredMASTER OF ENGINEERING (CDE)
dc.identifier.orcid0009-0002-4413-1304
Appears in Collections:Master's Theses (Closed)

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