Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/245832
DC Field | Value | |
---|---|---|
dc.title | FABRICATION AND CHARACTERIZATION OF FERROELECTRIC HF0.5ZR0.5O2 THIN FILMS | |
dc.contributor.author | WU YICHEN | |
dc.date.accessioned | 2023-11-08T18:00:18Z | |
dc.date.available | 2023-11-08T18:00:18Z | |
dc.date.issued | 2023-08-16 | |
dc.identifier.citation | WU YICHEN (2023-08-16). FABRICATION AND CHARACTERIZATION OF FERROELECTRIC HF0.5ZR0.5O2 THIN FILMS. ScholarBank@NUS Repository. | |
dc.identifier.uri | https://scholarbank.nus.edu.sg/handle/10635/245832 | |
dc.language.iso | en | |
dc.subject | Hafnia,Ferroelectricicty,Epitaxial growth,thin film,Oxygen vacancies,HZO | |
dc.type | Thesis | |
dc.contributor.department | MATERIALS SCIENCE AND ENGINEERING | |
dc.contributor.supervisor | Jingsheng Chen | |
dc.description.degree | Master's | |
dc.description.degreeconferred | MASTER OF ENGINEERING (CDE) | |
dc.identifier.orcid | 0009-0002-4413-1304 | |
Appears in Collections: | Master's Theses (Closed) |
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