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Title: | DIAMOND FILM GROWTH WITH MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD) | Authors: | GU JITENG | ORCID iD: | orcid.org/0000-0002-4778-4020 | Keywords: | NCD, Chemical Precursor, BEN, Dry-seeding, Diamond Metasurface, | Issue Date: | 10-Aug-2022 | Citation: | GU JITENG (2022-08-10). DIAMOND FILM GROWTH WITH MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD). ScholarBank@NUS Repository. | Abstract: | The growth of large area nanocrystalline diamond (NCD) film is of industrial interests because of their potential applications as hard mask. Here, we proposed “dry-seeding” methods to produce diamond grains for subsequent NCD film deposition on wafer-scaled silicon substrate. Owing to the formation of high crystalline diamond grains by “dry-seeding” method, the photochemically induced poly-adamantane, which served as a low-cost and high-density seeding layer, greatly reduced the film residual stress The NCD film grown by another “dry-seeding” method (Bias enhanced nucleation) exhibited ideal optical properties and rendered dynamic structural colors when a periodic array of asymmetric diamond cuboids with high-aspect ratio of ~3.1 was patterned on its surface. Our work demonstrates that the “dry-seeding” method combined with linear antenna MPCVD system can be potentially used for in-line deposition of NCD film mask and growth of high-quality NCD film. | URI: | https://scholarbank.nus.edu.sg/handle/10635/238649 |
Appears in Collections: | Ph.D Theses (Open) |
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